Members
Our team develops world leading process technology in Nanoimprint lithography (NIL) for production consideration. Since 2007, we successfully implemented NIL process onto high volume LED wafers, hard sapphire substrates and fragile lnP laser wafers for production.
With a unique hybrid process flow development, our team has integrated NIL process into several industry standard processes to deliver the products with nano-structure inside. With over a decade of experience in NIL, we are capable of manufacturing highly customized fine structures on different materials and continue to elaborate our NIL-hybrid technique to approach the quantum field application.