活動資訊-TOSIA 台灣光電暨化合物半導體產業協會

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研討會

4月8日-9日International Workshop on Wide-Band-Gap Power Electronics 2013

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  • 活動日期: 102年4月8日-9日
  • 活動地點: 工業技術研究院 中興院區 51館422國際會議廳
  • 主辦單位: 寬能隙電力電子研發聯盟WPEC
  • 聯絡人姓名: 洪尉淇 小姐
  • 聯絡人電話: 03-5912409
  • 聯絡人傳真: 03-5917690
  • 聯絡人Email: weichi_hong@itri.org.tw
  • 相關連結: http://seminar.itri.org.tw/onlinereg/RegAdd.aspx?msgno=51130008

      

In the last decade the technology fast moved to a critical point of soliciting better physical and electrical properties of wide band gap semiconductors. With SiC and GaN diodes on the market and more active devices at the corner, we are called for intense communication among industry, academia, research institutes and policy makers to facilitate the development and deploy of this technology.
International Workshop on WBG Power Electronics (IWWPE) 2013 will be held at ITRI Hsinchu campus, Taiwan on April 8 and 9, 2013, aimed to build a platform for sharing experiences, opinions and expectations in this field. In this workshop a dozen of experts on power electronics Technology Trend/Application, Device/Fabrication, Package/Reliability, Materials/Equipment, and vendors for the WBG power electronics will be invited to give lectures. She/He interested in this technology is cordially welcome to participate in this workshop.
 
                                              April 8, 2013 (Monday)

09:00~09:30
Registration
09:30~09:40
Opening/ Dr. C. T. Liu, EOL/ITRI
Time
Title of talk
Speaker
Affiliation
Session A: Technology Trend/ Application
09:40~10:20
Evolution of Silicon Power Devices and Future Possibility
Dr. Akio Nakagawa
Nakagawa Consulting Office, Japan
10:20~11:00
Wide Bandgap Semiconductor Devices for Future Energy Applications
Dr. Jih-Sheng Lai
Virginia Tech, USA
11:00~11:20
Coffee Break
11:20~12:00
Role of Advanced Power Devices for Green Electronics Age
Dr. Hiromichi Ohashi
Advanced Industrial Science and Technology, Japan
12:00~13:30
Lunch
Session B: Device/ Fabrication
13:30~14:10
Progress, Opportunities, and Challenges for Commercialization of SiC Power Devices
Dr. James Cooper
Purdue University, USA
14:10~14:50
Pushing the Performance Bar – 600V Class GaN Power Devices Application Case Studies
Mr. Zan Huang
Transphorm Inc., USA
14:50~15:10
Coffee Break
15:10~15:50
Recent Progress on GaN-based Power Devices
Dr. Nobuyuki Otsuka
Panasonic, Japan
15:50~16:30
Current Process Issues for Silicon Carbide Devices
Dr. Ander Hallen
KTH University, Sweden
16:30~18:00
Wrap up
18:00~20:00
Banquet (Venue: 4th floor of Royal Hsinchu hotel)

 
April 9, 2013 (Tuesday)

Time
Title of talk
Speaker
Affiliation
Session C: Package/ Reliability
09:30~10:10
Wide Bandgap Devices: Are There Thermal Testing Challenges?
Dr. András Poppe
Mentor Graphics
10:10~10:50
Reliability of Power Electronic
Dr. Yong Liu
Fairchild Semiconductor Corp.
10:50~11:10
Coffee Break
11:10~11:50
SiC Packaging Technology
Dr. Jack Bourne
Arkansas Power Electronics International, Inc., USA
11:50~13:10
Lunch
Session D: Material/Equipment
13:10~13:50
MOCVD Technology for GaN on Si Power Management Device Manufacturing
Dr. Christian Geng
AIXTRON Taiwan Co., Ltd.
13:50~14:30
Growth of AlGaN/GaN HEMT on 200mm Si with High Growth Rate (AlGaN/AlN) SLS Buffer Layer by Using 6X8" MOCVD Reactor
Dr. Koh Matsumoto
Taiyo Nippon Sanso EMC Ltd., Japan
14:30~15:10
The Latest Trend of Semiconductor SiC Wafer Technology and Its Challenges for the Future
Dr. Wataru Ohashi
Nippon Steel & Sumikin Materials Co., Ltd., Japan
15:10~15:30
Coffee Break
15:30~17:00
Panel Discussion / Hosted byDr. C. F. Huang

 
 

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